Invention Application
US20110133333A1 MICROELECTRONIC DEVICES INCLUDING CONDUCTIVE VIAS, CONDUCTIVE CAPS AND VARIABLE THICKNESS INSULATING LAYERS, AND METHODS OF FABRICATING SAME 有权
包括导电六面体,导电胶囊和可变厚度绝缘层的微电子器件及其制造方法

MICROELECTRONIC DEVICES INCLUDING CONDUCTIVE VIAS, CONDUCTIVE CAPS AND VARIABLE THICKNESS INSULATING LAYERS, AND METHODS OF FABRICATING SAME
Abstract:
Microelectronic devices include a conductive via that extends into a substrate face and that also protrudes beyond the substrate face to define a conductive via end surface and a conductive via sidewall that extends from the end surface towards the substrate face. A conductive cap is provided on the end surface, the conductive cap including a conductive cap body that extends across the end surface and a flange that extends from the conductive cap body along the conductive via sidewall towards the substrate face. Related fabrication methods are also described.
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