发明申请
- 专利标题: ELECTROLYTIC COPPER COATING, METHOD OF MANUFACTURING THE SAME, AND COPPER ELECTROLYTE FOR MANUFACTURING ELECTROLYTIC COPPER COATING
- 专利标题(中): 电解铜涂料,其制造方法和铜电解质制造电解铜涂料
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申请号: US12997420申请日: 2009-06-12
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公开(公告)号: US20110139626A1公开(公告)日: 2011-06-16
- 发明人: Takahiro Saito , Yuji Suzuki , Shoya Iuchi , Tetsuji Nishikawa
- 申请人: Takahiro Saito , Yuji Suzuki , Shoya Iuchi , Tetsuji Nishikawa
- 申请人地址: JP TOKYO JP HYOGO
- 专利权人: FURUKAWA ELECTRIC CO., LTD.,ISHIHARA CHEMICAL CO., LTD.
- 当前专利权人: FURUKAWA ELECTRIC CO., LTD.,ISHIHARA CHEMICAL CO., LTD.
- 当前专利权人地址: JP TOKYO JP HYOGO
- 优先权: JP2008-154025 20080612
- 国际申请: PCT/JP09/60792 WO 20090612
- 主分类号: C25D3/38
- IPC分类号: C25D3/38 ; C25D7/00
摘要:
An object of the present invention is to provide an electrolytic copper coating that exhibits a bendability and flexibility equal to or better than those of rolled copper foil after the heat history in a circuit board fabrication process, especially after a heat history equivalent to the heat history applied when bonding with a polyimide film. The present invention provides an electrolytic copper coating and a method of manufacturing the same wherein, when performing heat treatment so that the LMP value shown in Equation 1 becomes 9000 or more, the result becomes a crystal distribution of crystal grains, having a maximum length of crystal grains after heat treatment of 10 μm or more, of 70% or more: LMP=(T+273)*(20+Log t) Equation 1 where, 20 is a material constant of copper, T is temperature (° C.), and t is time (hr).
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