发明申请
- 专利标题： SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR, AND RECORDABLE OPTICAL RECORDING MEDIUM
- 专利标题（中）： 喷射目标及其制造方法及可记录光学记录介质
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申请号： US12971327申请日： 2010-12-17
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公开(公告)号： US20110143075A1公开(公告)日： 2011-06-16
- 发明人: Yoshitaka Hayashi , Noboru Sasa , Toshishige Fujii , Masayuki Fujiwara , Hiroshi Miura , Masaki Kato , Takeshi Kibe , Shinya Narumi
- 申请人： Yoshitaka Hayashi , Noboru Sasa , Toshishige Fujii , Masayuki Fujiwara , Hiroshi Miura , Masaki Kato , Takeshi Kibe , Shinya Narumi
- 申请人地址： JP Tokyo
- 专利权人： RICOH COMPANY, LTD.
- 当前专利权人： RICOH COMPANY, LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2006-055120 20060301; JP2006-213972 20060804
- 主分类号： B32B3/02
- IPC分类号： B32B3/02
摘要：
To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.