发明申请
US20110147060A1 DIELECTRIC FILM, DIELECTRIC ELEMENT, AND PROCESS FOR PRODUCING THE DIELECTRIC ELEMENT
审中-公开
电介质膜,电介质元件及制造电介质元件的方法
- 专利标题: DIELECTRIC FILM, DIELECTRIC ELEMENT, AND PROCESS FOR PRODUCING THE DIELECTRIC ELEMENT
- 专利标题(中): 电介质膜,电介质元件及制造电介质元件的方法
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申请号: US12993952申请日: 2009-05-25
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公开(公告)号: US20110147060A1公开(公告)日: 2011-06-23
- 发明人: Minoru Osada , Takayoshi Sasaki
- 申请人: Minoru Osada , Takayoshi Sasaki
- 优先权: JP2008-135379 20080523
- 国际申请: PCT/JP2009/059550 WO 20090525
- 主分类号: H05K1/00
- IPC分类号: H05K1/00 ; B32B5/00 ; B32B37/00 ; B05D1/18 ; B05D1/20 ; C04B35/462
摘要:
A monolayer or a multilayer of niobic acid nanosheets is attached to form a dielectric film, and other electrode is arranged on the surface of the dielectric film to construct a dielectric element, and the dielectric element thus provided realizes both high permittivity and good insulating properties even in a nano-region. Also provided is a method of producing the element at low temperatures with no influence of substrate interface deterioration and composition deviation thereof. The method entirely solves the problems of substrate interface deterioration and the accompanying composition deviation and electric incompatibility, and solves the intrinsic problem of “size effect” that the film thickness reduction to a nano-level lowers the specific permittivity and increases the leak current, and the method takes advantage of the peculiar properties and good ability of texture and structure regulation that the niobic acid nanosheet has.
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