发明申请
US20110147848A1 Multiple transistor fin heights 审中-公开
多晶体管翅片高度

Multiple transistor fin heights
摘要:
The present disclosure relates to the field of fabricating microelectronic devices. In at least one embodiment, the present subject matter relates to forming transistor fins of differing heights to obtain a performance improvement for a given type of integrated circuit within the microelectronic device.
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