发明申请
- 专利标题: Substrate media distortion analysis
- 专利标题(中): 基板介质失真分析
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申请号: US12655216申请日: 2009-12-23
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公开(公告)号: US20110150347A1公开(公告)日: 2011-06-23
- 发明人: Shen-ge Wang , Beilei Xu , Robert P. Loce
- 申请人: Shen-ge Wang , Beilei Xu , Robert P. Loce
- 申请人地址: US CT Norwalk
- 专利权人: Xerox Corporation
- 当前专利权人: Xerox Corporation
- 当前专利权人地址: US CT Norwalk
- 主分类号: G06K9/68
- IPC分类号: G06K9/68
摘要:
Embodiments described herein are directed to detecting and/or measuring distortions of substrate media that can occur during a printing process. The distortion can be detected and/or measured using a composite image generated from a reference image having a first periodic pattern and print image, disposed on a test substrate media, having a second periodic pattern. The first and second periodic patterns are specified so that the composite image includes a moiré pattern having moiré fringes resulting from interference between the first periodic pattern associated with the reference image and the second periodic pattern associated with the print image. The moiré fringes can be used to detect and calculate an amount of distortion of the test substrate media.
公开/授权文献
- US08467592B2 Substrate media distortion analysis 公开/授权日:2013-06-18
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