发明申请
US20110172710A1 MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
有权
最小的入侵互动过程间隙植入物和方法
- 专利标题: MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
- 专利标题(中): 最小的入侵互动过程间隙植入物和方法
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申请号: US12940130申请日: 2010-11-05
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公开(公告)号: US20110172710A1公开(公告)日: 2011-07-14
- 发明人: Daniel THOMMEN , Markus WEBER , Jacques TEISEN , Markus KRAFT , Florian KAUFMANN , Markus HUNZIKER , Felix ASCHMANN , Stefan SALADIN , Martin OSWALD , Roman RANDEGGER
- 申请人: Daniel THOMMEN , Markus WEBER , Jacques TEISEN , Markus KRAFT , Florian KAUFMANN , Markus HUNZIKER , Felix ASCHMANN , Stefan SALADIN , Martin OSWALD , Roman RANDEGGER
- 申请人地址: US PA WEST CHESTER
- 专利权人: SYNTHES USA, LLC
- 当前专利权人: SYNTHES USA, LLC
- 当前专利权人地址: US PA WEST CHESTER
- 主分类号: A61B17/70
- IPC分类号: A61B17/70
摘要:
An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body, a first deployable protrusion and a second deployable protrusion. The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and an expanded configuration. The first deployable protrusion is mounted proximate the proximal end and the second deployable protrusion is mounted proximate the distal end. The first and second deployable protrusions are oriented generally parallel to the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.
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