发明申请
- 专利标题： POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- 专利标题（中）： 聚合物，耐腐蚀组合物和方法
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申请号： US13006598申请日： 2011-01-14
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公开(公告)号： US20110177455A1公开(公告)日： 2011-07-21
- 发明人: Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
- 申请人： Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
- 优先权： JP2010-007945 20100118
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F14/18 ; C08F18/20 ; G03F7/20
摘要：
A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
公开/授权文献
- US08420292B2 Polymer, resist composition, and patterning process 公开/授权日：2013-04-16
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