发明申请
US20110178319A1 METHOD FOR MAKING HARMFUL COMPOUND HARMLESS AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT COMPOUND
有权
制造有机化合物的方法和用于生产有机半导体元素化合物的方法
- 专利标题： METHOD FOR MAKING HARMFUL COMPOUND HARMLESS AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT COMPOUND
- 专利标题（中）： 制造有机化合物的方法和用于生产有机半导体元素化合物的方法
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申请号： US13120377申请日： 2009-11-02
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公开(公告)号： US20110178319A1公开(公告)日： 2011-07-21
- 发明人: Koichiro Nakamura
- 申请人： Koichiro Nakamura
- 申请人地址： JP Tokyo
- 专利权人： NIPPON SHEET GLASS COMPANY, LIMITED
- 当前专利权人： NIPPON SHEET GLASS COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-285882 20081106
- 国际申请： PCT/JP2009/068777 WO 20091102
- 主分类号： C07F9/72
- IPC分类号： C07F9/72
摘要：
The present invention provides a method for making a harmful arsenic compound, antimony compound and selenium compound harmless by using an organic cobalt complex, in which the cost of the method can be improved. The present invention is a method for making a harmful compound harmless, including irradiating light to an organic cobalt complex containing cobalt as a central metal and a corrin ring as a ligand, a methyl group donor, a titanium oxide photocatalyst, and a harmful compound containing an arsenic atom, an antimony atom or a selenium atom to methylate the harmful compound. In the present invention, it is preferable that the harmful compound be trimethylated.
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