发明申请
- 专利标题: MANUFACTURING METHOD FOR LIQUID CRYSTAL APPARATUS
- 专利标题(中): 液晶装置制造方法
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申请号: US13081880申请日: 2011-04-07
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公开(公告)号: US20110183451A1公开(公告)日: 2011-07-28
- 发明人: Shinichiro Tanaka , Masakatsu Higa , Shuhei Yoshida
- 申请人: Shinichiro Tanaka , Masakatsu Higa , Shuhei Yoshida
- 申请人地址: JP Tokyo
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-252587 20080930
- 主分类号: H01L33/58
- IPC分类号: H01L33/58
摘要:
A manufacturing method for a liquid crystal apparatus of a transverse electric field system that is provided with a liquid crystal layer sandwiched between a first substrate and a second substrate and a pixel electrode and a common electrode formed on the first substrate and is arranged to drive liquid crystal through an electric field generated between the pixel electrode and the common electrode includes the steps of forming a material layer made of photosensitive resin on a glass substrate and performing an exposure processing with a predetermined exposure pattern, performing a development processing on the material layer and forming a resin light interruption layer having an opening section that exposes the glass substrate in a bottom section, forming an electrostatic interruption layer while covering the resin light interruption layer, and providing a colored layer in an area overlapped with the opening section on the electrostatic interruption layer.
公开/授权文献
- US08460953B2 Manufacturing method for liquid crystal apparatus 公开/授权日:2013-06-11
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