发明申请
US20110185804A1 Apparatus and Method for Quantatively Measuring Liquid Film Drying Rates on Substrates
审中-公开
用于定量测量基片上液膜干燥速率的装置和方法
- 专利标题： Apparatus and Method for Quantatively Measuring Liquid Film Drying Rates on Substrates
- 专利标题（中）： 用于定量测量基片上液膜干燥速率的装置和方法
-
申请号： US12984367申请日： 2011-01-04
-
公开(公告)号： US20110185804A1公开(公告)日： 2011-08-04
- 发明人: Ryszard Sprycha , Doreen Smith , David Biro , Juanita Parris , Mikhail Laksin , Gregory Pace
- 申请人： Ryszard Sprycha , Doreen Smith , David Biro , Juanita Parris , Mikhail Laksin , Gregory Pace
- 申请人地址： US NJ Parsippany
- 专利权人： Sun Chemical Corporation
- 当前专利权人： Sun Chemical Corporation
- 当前专利权人地址： US NJ Parsippany
- 主分类号： G01N33/00
- IPC分类号： G01N33/00
摘要：
An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.