发明申请
US20110186829A1 Surface Treated Substrates for Top Gate Organic Thin Film Transistors 审中-公开
顶栅有机薄膜晶体管表面处理基板

Surface Treated Substrates for Top Gate Organic Thin Film Transistors
摘要:
A method of forming a top gate transistor comprising the steps of providing a substrate carrying source and drain electrodes defining a channel region therebetween; treating at least part of the surface of the channel region to reduce its polarity; and depositing a semiconductor layer in the channel.
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