发明申请
US20110189609A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
有权
丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
- 专利标题（中）： 丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
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申请号： US13015874申请日： 2011-01-28
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公开(公告)号： US20110189609A1公开(公告)日： 2011-08-04
- 发明人: Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
- 申请人： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-019284 20100129
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; C07C309/31 ; C07D327/08 ; C07D333/76
摘要：
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å3 or greater.