发明申请
- 专利标题: RESISTANCE MEMORY DEVICES AND METHODS OF FORMING THE SAME
- 专利标题(中): 电阻记忆体装置及其形成方法
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申请号: US12963148申请日: 2010-12-08
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公开(公告)号: US20110193051A1公开(公告)日: 2011-08-11
- 发明人: KyungTae NAM , Ingyu Baek
- 申请人: KyungTae NAM , Ingyu Baek
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2010-0011555 20100208
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L21/02
摘要:
Provided are resistance memory devices and methods of forming the same. The resistance memory devices include a first electrode and a second electrode on a substrate, a transition metal oxide layer interposed between the first electrode and the second electrode, an electrolyte layer interposed between the second electrode and the transition metal oxide layer, and conductive bridges having one end that is electrically connected to the second electrode on the electrolyte.
公开/授权文献
- US08581364B2 Resistance memory devices and methods of forming the same 公开/授权日:2013-11-12
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