发明申请
- 专利标题： Substrate, an Inspection Apparatus, and a Lithographic Apparatus
- 专利标题（中）： 基板，检查装置和平版印刷装置
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申请号： US13059408申请日： 2009-07-09
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公开(公告)号： US20110194092A1公开(公告)日： 2011-08-11
- 发明人: Hendrik Jan Hidde Smilde , Willem Marie Julia Marcel Coene
- 申请人： Hendrik Jan Hidde Smilde , Willem Marie Julia Marcel Coene
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2009/006473 WO 20090709
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G01J1/42 ; G03F7/20 ; B32B3/00
摘要：
A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced
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