发明申请
US20110195540A1 COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL
审中-公开
用于形成P型扩散层的组合物，形成P型扩散层的方法和用于生产光伏电池的方法
- 专利标题： COMPOSITION FOR FORMING P-TYPE DIFFUSION LAYER, METHOD FOR FORMING P-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL
- 专利标题（中）： 用于形成P型扩散层的组合物，形成P型扩散层的方法和用于生产光伏电池的方法
-
申请号： US13013376申请日： 2011-01-25
-
公开(公告)号： US20110195540A1公开(公告)日： 2011-08-11
- 发明人: YOUICHI MACHII , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi
- 申请人： YOUICHI MACHII , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi
- 专利权人： HITACHI CHEMICAL COMPANY, LTD.
- 当前专利权人： HITACHI CHEMICAL COMPANY, LTD.
- 优先权： JP2011-005312 20110113
- 主分类号： H01L31/18
- IPC分类号： H01L31/18 ; H01L21/225 ; H01B1/00 ; H01B1/02
摘要：
The composition for forming a p-type diffusion layer in accordance with the present invention contains an acceptor element-containing glass powder and a dispersion medium. A p-type diffusion layer and a photovoltaic cell having a p-type diffusion layer are prepared by applying the composition for forming a p-type diffusion layer, followed by a thermal diffusion treatment.