发明申请
US20110196122A1 (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
审中-公开
（METH）丙烯酸衍生物，具有结构的聚合物和光催化组合物，以及使用其形成图案的方法
- 专利标题： (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
- 专利标题（中）： （METH）丙烯酸衍生物，具有结构的聚合物和光催化组合物，以及使用其形成图案的方法
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申请号： US13088311申请日： 2011-04-15
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公开(公告)号： US20110196122A1公开(公告)日： 2011-08-11
- 发明人: Katsumi Maeda , Shigeyuki Iwasa , Kaichiro Nakano , Etsuo Hasegawa
- 申请人： Katsumi Maeda , Shigeyuki Iwasa , Kaichiro Nakano , Etsuo Hasegawa
- 专利权人： NEC Corporation
- 当前专利权人： NEC Corporation
- 优先权： JP188853/1998 19980703; JP328491-1998 20081118
- 主分类号： C08F222/14
- IPC分类号： C08F222/14
摘要：
There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
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