发明申请
- 专利标题： OPTICAL MASK FOR ALL-OPTICAL EXTENDED DEPTH-OF-FIELD FOR IMAGING SYSTEMS UNDER INCOHERENT ILLUMINATION
- 专利标题（中）： 用于无光照射下成像系统全光学扩展深度的光学掩模
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申请号： US13027286申请日： 2011-02-15
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公开(公告)号： US20110197428A1公开(公告)日： 2011-08-18
- 发明人: Eyal Ben-Eliezer , Emanuel Marom , Naim Konforti , Zeev Zalevsky
- 申请人： Eyal Ben-Eliezer , Emanuel Marom , Naim Konforti , Zeev Zalevsky
- 申请人地址： IL Tel Aviv
- 专利权人： Ramot at Tel Aviv University Ltd.
- 当前专利权人： Ramot at Tel Aviv University Ltd.
- 当前专利权人地址： IL Tel Aviv
- 主分类号： B23P11/00
- IPC分类号： B23P11/00
摘要：
A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to comprise multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter ψ, transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.
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