发明申请
- 专利标题： Lithographic Apparatus and Device Manufacturing Method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： US13013333申请日： 2011-01-25
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公开(公告)号： US20110205511A1公开(公告)日： 2011-08-25
- 发明人: Alexander Viktorovych Padiy , Boris Menchtchikov , Scott Anderson Middlebrooks
- 申请人： Alexander Viktorovych Padiy , Boris Menchtchikov , Scott Anderson Middlebrooks
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A method controls scanning function of a lithographic apparatus. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Compensation is performed based on the determination. A different parameterization is used for control of the scanning control module than for communication between the scanning control module and the lithographic apparatus.
公开/授权文献
- US08947630B2 Lithographic apparatus and device manufacturing method 公开/授权日：2015-02-03
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