发明申请
- 专利标题： Substrate, a Method of Measuring a Property, an Inspection Apparatus and a Lithographic Apparatus
- 专利标题（中）： 基板，测量属性的方法，检查装置和平版印刷装置
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申请号： US13059405申请日： 2009-07-27
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公开(公告)号： US20110205518A1公开(公告)日： 2011-08-25
- 发明人: Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
- 申请人： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Hendrik Jan Hidde Smilde
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2009/005419 WO 20090727
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G01B9/02 ; B32B3/30
摘要：
Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
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