发明申请
- 专利标题： Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product
- 专利标题（中）： 平版印刷设备，设备制造方法及相关数据处理设备及计算机程序产品
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申请号： US13009250申请日： 2011-01-19
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公开(公告)号： US20110216294A1公开(公告)日： 2011-09-08
- 发明人: Boris Menchtchikov , Alexander Viktorovych Padiy
- 申请人： Boris Menchtchikov , Alexander Viktorovych Padiy
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.