发明申请
US20110229990A1 FORMING AND TRAINING PROCESSES FOR RESISTANCE-CHANGE MEMORY CELL 有权
电阻变化记忆细胞的形成和培训过程

  • 专利标题: FORMING AND TRAINING PROCESSES FOR RESISTANCE-CHANGE MEMORY CELL
  • 专利标题(中): 电阻变化记忆细胞的形成和培训过程
  • 申请号: US12842810
    申请日: 2010-07-23
  • 公开(公告)号: US20110229990A1
    公开(公告)日: 2011-09-22
  • 发明人: Franz KreuplDeepak C. Sekar
  • 申请人: Franz KreuplDeepak C. Sekar
  • 主分类号: H01L21/66
  • IPC分类号: H01L21/66 H01L21/16
FORMING AND TRAINING PROCESSES FOR RESISTANCE-CHANGE MEMORY CELL
摘要:
During the manufacture of a set of non-volatile resistance-switching memory elements, a forming process is performed in which a voltage is applied over forming period until a conductive filament is formed in a resistance-switching layer. A heat source at a temperature of 50° C. to 150° C. is applied to expedite the forming process while reducing the required magnitude of the applied voltage. Manufacturing time and reliability are improved. After the forming process, an expedited training process can be performed in which a fixed number of cycles of voltage pulses are applied without verifying the memory elements. Subsequently, the memory elements are verified by determining their read current in an evaluation. Another fixed number of cycles of voltage pulses is applied without verifying the memory elements, if the memory elements do not pass the evaluation.
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