发明申请
- 专利标题: Semiconductor Device and Method of Forming Three-Dimensional Vertically Oriented Integrated Capacitors
- 专利标题(中): 形成三维垂直取向的集成电容器的半导体器件和方法
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申请号: US13155312申请日: 2011-06-07
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公开(公告)号: US20110233726A1公开(公告)日: 2011-09-29
- 发明人: Rui Huang , Heap Hoe Kuan , Yaojian Lin , Seng Guan Chow
- 申请人: Rui Huang , Heap Hoe Kuan , Yaojian Lin , Seng Guan Chow
- 申请人地址: SG Singapore
- 专利权人: STATS CHIPPAC, LTD.
- 当前专利权人: STATS CHIPPAC, LTD.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L27/04
- IPC分类号: H01L27/04
摘要:
A semiconductor device includes conductive pillars disposed vertically over a seed layer, a conformal insulating layer formed over the conductive pillars, and a conformal conductive layer formed over the conformal insulating layer. A first conductive pillar, the conformal insulating layer, and the conformal conductive layer constitute a vertically oriented integrated capacitor. The semiconductor device further includes a semiconductor die or component mounted over the seed layer, an encapsulant deposited over the semiconductor die or component and around the conformal conductive layer, and a first interconnect structure formed over a first side of the encapsulant. The first interconnect structure is electrically connected to a second conductive pillar, and includes an integrated passive device. The semiconductor device further includes a second interconnect structure formed over a second side of the encapsulant opposite the first side of the encapsulant.
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