发明申请
- 专利标题: Diffraction Based Overlay Linearity Testing
- 专利标题(中): 基于衍射的覆盖线性度测试
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申请号: US13053584申请日: 2011-03-22
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公开(公告)号: US20110238365A1公开(公告)日: 2011-09-29
- 发明人: Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
- 申请人: Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
- 申请人地址: US CA Milpitas
- 专利权人: NANOMETRICS INCORPORATED
- 当前专利权人: NANOMETRICS INCORPORATED
- 当前专利权人地址: US CA Milpitas
- 主分类号: G06F15/00
- IPC分类号: G06F15/00 ; G01B11/00
摘要:
An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.
公开/授权文献
- US09239523B2 Diffraction based overlay linearity testing 公开/授权日:2016-01-19
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