发明申请
US20110242464A1 INSULATED GATE TRANSISTOR, ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING THE SAME 有权
绝缘栅晶体管,有源矩阵基板,液晶显示装置及其制造方法

  • 专利标题: INSULATED GATE TRANSISTOR, ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING THE SAME
  • 专利标题(中): 绝缘栅晶体管,有源矩阵基板,液晶显示装置及其制造方法
  • 申请号: US13133212
    申请日: 2009-12-16
  • 公开(公告)号: US20110242464A1
    公开(公告)日: 2011-10-06
  • 发明人: Kiyohiro Kawasaki
  • 申请人: Kiyohiro Kawasaki
  • 申请人地址: JP Osaka-shi, Osaka
  • 专利权人: SHARP KABUSHIKI KAISHA
  • 当前专利权人: SHARP KABUSHIKI KAISHA
  • 当前专利权人地址: JP Osaka-shi, Osaka
  • 优先权: JP2008-324391 20081219
  • 国际申请: PCT/JP2009/070998 WO 20091216
  • 主分类号: G02F1/1335
  • IPC分类号: G02F1/1335 H01L29/786 H01L21/336 H01L33/02
INSULATED GATE TRANSISTOR, ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING THE SAME
摘要:
According to the insulated gate transistor, a gate electrode (11A) is provided on a main surface of a glass substrate (2); a first part of an insulating layer (gate insulating layer (30) and transparent inorganic insulating layer (60)) is thicker than a second part of the insulating layer (gate insulating layer (30)), the first part being between (i) the gate electrode (11A) and (ii) a source electrode (12) and a drain electrode (21) of the insulated gate transistor, and the second part being between (i) the gate electrode (11A) and (ii) a channel section (31A) of the insulated gate transistor. This makes it possible to reduce parasitic capacitor without deteriorating characteristics of the transistor.
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