发明申请
- 专利标题： FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- 专利标题（中）： 氟化单体，聚合物，电阻组合物和方法
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申请号： US13081182申请日： 2011-04-06
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公开(公告)号： US20110250539A1公开(公告)日： 2011-10-13
- 发明人: Masayoshi SAGEHASHI , Koji Hasegawa , Takeshi Sasami
- 申请人： Masayoshi SAGEHASHI , Koji Hasegawa , Takeshi Sasami
- 优先权： JP2010-088537 20100407
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F22/20 ; C07D317/72 ; C08F20/28 ; C07D317/34 ; G03F7/20
摘要：
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
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