发明申请
- 专利标题: Semiconductor Material Doping
- 专利标题(中): 半导体材料掺杂
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申请号: US13162908申请日: 2011-06-17
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公开(公告)号: US20110253975A1公开(公告)日: 2011-10-20
- 发明人: Maxim S. Shatalov , Remigijus Gaska , Jinwei Yang , Michael Shur
- 申请人: Maxim S. Shatalov , Remigijus Gaska , Jinwei Yang , Michael Shur
- 主分类号: H01L33/04
- IPC分类号: H01L33/04
摘要:
A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. Additionally, a target doping level for the quantum well and/or adjacent barrier can be selected to facilitate a real space transfer of holes across the barrier. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity and/or actual doping level(s) correspond to the relevant target(s).
公开/授权文献
- US09368580B2 Semiconductor material doping 公开/授权日:2016-06-14
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