发明申请
- 专利标题: CONDUCTIVE MEMBER AND METHOD FOR PRODUCING THE SAME
- 专利标题(中): 导电构件及其制造方法
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申请号: US12998700申请日: 2009-07-09
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公开(公告)号: US20110266035A1公开(公告)日: 2011-11-03
- 发明人: Takeshi Sakurai , Seiichi Ishikawa , Kenji Kubota , Takashi Tamagawa
- 申请人: Takeshi Sakurai , Seiichi Ishikawa , Kenji Kubota , Takashi Tamagawa
- 申请人地址: JP Shinagawa-ku
- 专利权人: MITSUBISHI SHINDOH CO., LTD.
- 当前专利权人: MITSUBISHI SHINDOH CO., LTD.
- 当前专利权人地址: JP Shinagawa-ku
- 优先权: JP2009-009752 20090120; JP2009-039303 20090223
- 国际申请: PCT/JP2009/003219 WO 20090709
- 主分类号: H05K1/03
- IPC分类号: H05K1/03 ; H05K3/00
摘要:
[Object] To provide a conductive member which has a stable contact resistance, is difficult to be separated, and also decreases the inserting and drawing force when used for a connector.[Means to Solve Problems] A Cu—Sn intermetallic compound layer 3 and an Sn-based surface layer 4 are formed in this order on the surface of a Cu-based substrate 1 through an Ni-based base layer 2, and, furthermore, the Cu—Sn intermetallic compound layer 3 is composed of a Cu3Sn layer 5 arranged on the Ni-based base layer 2 and a Cu6Sn5 layer 6 arranged on the Cu3Sn layer 5; the Cu—Sn intermetallic compound layer 3 obtained by bonding the Cu3Sn layer 5 and the Cu6Sn5 layer 6 is provided with recessed and projected portions on the surface which is in contact with the Sn-based surface layer 4; thicknesses X of the recessed portions 7 are set to 0.05 μm to 1.5 μm, the area coverage of the Cu3Sn layer 5 with respect to the Ni-based base layer 2 is 60% or higher, the ratio of the thicknesses of the projected portions 8 to the thicknesses Y of the recessed portions 7 in the Cu—Sn intermetallic compound layer 3 is 1.2 to 5, and the average thickness of the Cu3Sn layer 5 is 0.01 μm to 0.5 μm.[Selected Drawing] FIG. 1
公开/授权文献
- US08698002B2 Conductive member and method for producing the same 公开/授权日:2014-04-15
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