发明申请
- 专利标题: FIELD-EFFECT TRANSISTOR
- 专利标题(中): 场效应晶体管
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申请号: US13111357申请日: 2011-05-19
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公开(公告)号: US20110278540A1公开(公告)日: 2011-11-17
- 发明人: Kenichiro Tanaka , Tetsuzo Ueda , Hisayoshi Matsuo , Masahiro Hikita
- 申请人: Kenichiro Tanaka , Tetsuzo Ueda , Hisayoshi Matsuo , Masahiro Hikita
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 优先权: JP2008-298735 20081121
- 主分类号: H01L29/12
- IPC分类号: H01L29/12
摘要:
Provided is a field-effect transistor which is capable of suppressing current collapse. An HEMT as the field-effect transistor includes: a first semiconductor layer made of a first nitride semiconductor; and a second semiconductor layer formed on the first semiconductor layer and made of a second nitride semiconductor having a greater band gap than a band gap of the first nitride semiconductor, wherein the first semiconductor layer includes a region in which a threading dislocation density increases in a stacking direction.
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