Invention Application
US20110284166A1 LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE
有权
具有集成流量均衡器和改进的导体的下层
- Patent Title: LOWER LINER WITH INTEGRATED FLOW EQUALIZER AND IMPROVED CONDUCTANCE
- Patent Title (中): 具有集成流量均衡器和改进的导体的下层
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Application No.: US13191850Application Date: 2011-07-27
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Publication No.: US20110284166A1Publication Date: 2011-11-24
- Inventor: JAMES D. CARDUCCI , ANDREW NGUYEN , AJIT BALAKRISHNA , MICHAEL C. KUTNEY
- Applicant: JAMES D. CARDUCCI , ANDREW NGUYEN , AJIT BALAKRISHNA , MICHAEL C. KUTNEY
- Main IPC: H01L21/3065
- IPC: H01L21/3065
Abstract:
A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.
Public/Granted literature
- US08118938B2 Lower liner with integrated flow equalizer and improved conductance Public/Granted day:2012-02-21
Information query
IPC分类:
