发明申请
- 专利标题: DEVICE AND METHOD FOR COATING A SUBSTRATE USING CVD
- 专利标题(中): 使用CVD涂覆基板的装置和方法
-
申请号: US13130728申请日: 2009-11-13
-
公开(公告)号: US20110287192A1公开(公告)日: 2011-11-24
- 发明人: Martin Rueffer , Stefan Rosiwal , Christian Bareiss , Walter Reichert , Oliver Lemmer , Marc Perle
- 申请人: Martin Rueffer , Stefan Rosiwal , Christian Bareiss , Walter Reichert , Oliver Lemmer , Marc Perle
- 申请人地址: DE Wuerselen DE Fuerth
- 专利权人: CEMECON AG,DIACCON GMBH
- 当前专利权人: CEMECON AG,DIACCON GMBH
- 当前专利权人地址: DE Wuerselen DE Fuerth
- 优先权: DE102008044025.6 20081124
- 国际申请: PCT/EP09/65177 WO 20091113
- 主分类号: C23C16/448
- IPC分类号: C23C16/448
摘要:
The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said heat conductors extending between a first (1) and a second electrode (8), wherein the heat conductors (2) are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (2), the invention proposes that the tensioning device comprises a tilt arm (5) having a tensioning weight (G), the heat conductor (2) being attached to the first end (E1) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).
公开/授权文献
- US09127350B2 Device and method for coating a substrate using CVD 公开/授权日:2015-09-08