发明申请
US20110290656A1 METHOD FOR ELECTROCHEMICALLY DEPOSITING CARBON NITRIDE FILMS ON A SUBSTRATE
有权
用于电化学沉积在衬底上的碳氮化物膜的方法
- 专利标题： METHOD FOR ELECTROCHEMICALLY DEPOSITING CARBON NITRIDE FILMS ON A SUBSTRATE
- 专利标题（中）： 用于电化学沉积在衬底上的碳氮化物膜的方法
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申请号： US12789959申请日： 2010-05-28
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公开(公告)号： US20110290656A1公开(公告)日： 2011-12-01
- 发明人: Tokujiro NISHIKIORI , Hiroaki AMAHASHI , Kouji KURODA , Yasuhiko ITO , Kazuhito FUKASAWA , Naohiro YASUDA
- 申请人： Tokujiro NISHIKIORI , Hiroaki AMAHASHI , Kouji KURODA , Yasuhiko ITO , Kazuhito FUKASAWA , Naohiro YASUDA
- 申请人地址： JP Aichi JP Kyoto JP Hyogo JP Kyoto
- 专利权人： TOYOTA BOSHOKU KABUSHIKI KAISHA,THE DOSHISHA,SEC CARBON, LIMITED,I'MSEP CO., LTD.
- 当前专利权人： TOYOTA BOSHOKU KABUSHIKI KAISHA,THE DOSHISHA,SEC CARBON, LIMITED,I'MSEP CO., LTD.
- 当前专利权人地址： JP Aichi JP Kyoto JP Hyogo JP Kyoto
- 主分类号： C25D3/66
- IPC分类号： C25D3/66 ; C25D9/04
摘要：
Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.