发明申请
- 专利标题: METHOD AND APPARATUS FOR CLEANING ORGANIC DEPOSITION MATERIALS
- 专利标题(中): 清洁有机沉积材料的方法和装置
-
申请号: US13208261申请日: 2011-08-11
-
公开(公告)号: US20110293819A1公开(公告)日: 2011-12-01
- 发明人: Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
- 申请人: Jung-Min Lee , Choong-Ho Lee , Yoon-Chan Oh , Hee-Seong Jeong
- 优先权: KR10-2009-0051064 20090609; KR10-2010-0012406 20100210
- 主分类号: B05D5/06
- IPC分类号: B05D5/06 ; C23C14/04
摘要:
A method of cleaning off organic deposition material accumulated on a mask includes forming an organic deposition material pattern on a substrate using the mask, which includes a plurality of slots, in a deposition chamber including a deposition source; transporting the mask to a stock chamber that is maintained at a vacuum and adjacent to the deposition chamber; and partially cleaning off the organic deposition material accumulated along the boundaries of the slots of the mask in the stock chamber. A system to clean off an organic deposition material accumulated on a mask having a plurality of slots, includes a deposition chamber including a deposition source; and a stock chamber that is maintained at substantially the same vacuum as the deposition chamber and includes a cleaning device that cleans off the organic deposition material accumulated on the mask.