发明申请
- 专利标题: THREE DIMENSIONAL SEMICONDUCTOR DEVICE
- 专利标题(中): 三维半导体器件
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申请号: US13153009申请日: 2011-06-03
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公开(公告)号: US20110298038A1公开(公告)日: 2011-12-08
- 发明人: Yong-Hoon SON , Kihyun Hwang
- 申请人: Yong-Hoon SON , Kihyun Hwang
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2010-0052439 20100603
- 主分类号: H01L29/792
- IPC分类号: H01L29/792
摘要:
Provided are a three-dimensional semiconductor memory device and manufacturing method of the three-dimensional semiconductor memory device. The three-dimensional semiconductor memory device may include a gate structure on a substrate with the gate structure including a plurality of gate electrodes. Conductive lines are disposed between the gate structure and the substrate. A horizontal semiconductor pattern is disposed between the gate structure and the conductive line. And a vertical semiconductor pattern penetrating the gate structure is connected to the horizontal semiconductor pattern.
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