发明申请
US20110300482A1 SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION 有权
硫酸钠,光酸发生器和感光树脂组合物

  • 专利标题: SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
  • 专利标题(中): 硫酸钠,光酸发生器和感光树脂组合物
  • 申请号: US13202044
    申请日: 2010-02-04
  • 公开(公告)号: US20110300482A1
    公开(公告)日: 2011-12-08
  • 发明人: Issei SuzukiHideki Kimura
  • 申请人: Issei SuzukiHideki Kimura
  • 申请人地址: JP Kyoto-shi, Kyoto
  • 专利权人: SAN-APRO, LTD
  • 当前专利权人: SAN-APRO, LTD
  • 当前专利权人地址: JP Kyoto-shi, Kyoto
  • 优先权: JP2009-038698 20090220; JP2009-066247 20090318; JP2009-191499 20090820
  • 国际申请: PCT/JP2010/000683 WO 20100204
  • 主分类号: G03F7/004
  • IPC分类号: G03F7/004 C07C317/10 C07F9/92 C07F5/02 G03F7/20 C07F9/06
SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
摘要:
There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X− represents a monovalent polyatomic anion].
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