Invention Application
US20110303363A1 PLASMA PROCESSING APPARATUS 审中-公开
等离子体加工设备

PLASMA PROCESSING APPARATUS
Abstract:
A microwave plasma processing apparatus for plasma-processing a substrate by exciting a gas by the microwave includes a processing container formed of metal, a microwave source for outputting the microwave, a first dielectric member that faces an inner wall of the processing container and for transmitting the microwave output from the microwave source into the processing container, and a second dielectric member that is provided on an inner surface of the processing container and restrains the microwave from propagating along the inner surface of the processing container.
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