发明申请
- 专利标题: DEFECT INSPECTING APPARATUS AND DEFECT INSPECTING METHOD
- 专利标题(中): 缺陷检查装置和缺陷检查方法
-
申请号: US13146033申请日: 2009-12-10
-
公开(公告)号: US20110311126A1公开(公告)日: 2011-12-22
- 发明人: Kaoru Sakai , Shunji Maeda
- 申请人: Kaoru Sakai , Shunji Maeda
- 优先权: JP2009-015282 20090127
- 国际申请: PCT/JP2009/006767 WO 20091210
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A defect inspecting apparatus provide with an illumination optical system and a detection optical system is further provided with an image processing section, which has: a feature calculating section, which calculates a feature based on the inputted design data of the object to be inspected, and calculates a feature quantity based on a plurality of pieces of image data, which are acquired by the detection optical system and have different optical conditions or image data acquisition conditions; a defect candidate detecting section which integrates the feature obtained from the calculated design data and the feature quantity obtained from the plurality of pieces of image data and detects candidates; and a defect extracting section which extracts a highly critical defect from the detected defect candidates, based on the feature of the design data calculated by the feature calculating section.
信息查询