发明申请
- 专利标题: VITREOUS SILICA CRUCIBLE AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING SILICON INGOT
- 专利标题(中): 耐热二氧化硅溶液及其制造方法以及制造硅胶的方法
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申请号: US13166189申请日: 2011-06-22
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公开(公告)号: US20110315072A1公开(公告)日: 2011-12-29
- 发明人: Toshiaki SUDO , Hiroshi KISHI , Eriko SUZUKI
- 申请人: Toshiaki SUDO , Hiroshi KISHI , Eriko SUZUKI
- 申请人地址: JP Akita-shi
- 专利权人: JAPAN SUPER QUARTZ CORPORATION
- 当前专利权人: JAPAN SUPER QUARTZ CORPORATION
- 当前专利权人地址: JP Akita-shi
- 优先权: JP2010-145565 20100625
- 主分类号: C30B15/30
- IPC分类号: C30B15/30 ; C30B15/04 ; C30B15/10 ; C03B19/01 ; C03B20/00
摘要:
Provided is a vitreous silica crucible which can suppress inward sagging and buckling of the sidewall effectively even when time for pulling silicon ingots is extremely long. According to the present invention, provided is a vitreous silica crucible for pulling a silicon single crystal, wherein the crucible has a wall comprising, from an inner surface toward an outer surface of the crucible, a transparent vitreous silica layer having a bubble content rate of less than 0.5%, a bubble-containing vitreous silica layer having a bubble content rate of 1% or more and less than 50%, a semi-transparent vitreous silica layer having a bubble content rate of 0.5% or more and less than 1.0% and having an OH group concentration of 35 ppm or more and less than 300 ppm.