发明申请
- 专利标题： METHODS FOR ENHANCED PROCESSING CHAMBER CLEANING
- 专利标题（中）： 用于增强加工室清洁度的方法
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申请号： US13175170申请日： 2011-07-01
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公开(公告)号： US20120000490A1公开(公告)日： 2012-01-05
- 发明人: HUA CHUNG , Sang Won Kang
- 申请人： HUA CHUNG , Sang Won Kang
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B08B9/00
- IPC分类号： B08B9/00
摘要：
Methods and apparatus for cleaning a showerhead and other chamber components used in a chemical vapor deposition process are provided. The methods comprise establishing a thermal gradient in a chamber having a showerhead assembly with deposited material thereon, providing a halogen containing cleaning gas to the chamber, wherein the thermal gradient causes a turbulent or convective flow of the cleaning gas, removing the coating of deposited material from the showerhead assembly by reacting the halogen containing cleaning gas with the deposited material, and exhausting reaction by-products from the chamber.