Invention Application
- Patent Title: Lithographic Apparatus and Method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US12975898Application Date: 2010-12-22
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Publication No.: US20120002182A1Publication Date: 2012-01-05
- Inventor: Han-Kwang Nienhuys , Peter Gerardus Jonkers , Alexander Marinus Arnoldus Huijberts
- Applicant: Han-Kwang Nienhuys , Peter Gerardus Jonkers , Alexander Marinus Arnoldus Huijberts
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
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