发明申请
- 专利标题： TEMPLATE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TEMPLATE
- 专利标题（中）： 模式制造方法，半导体器件制造方法和模板
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申请号： US13150961申请日： 2011-06-01
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公开(公告)号： US20120009799A1公开(公告)日： 2012-01-12
- 发明人: Tsukasa AZUMA , Tatsuhiko Higashiki , Kyoichi Suguro
- 申请人： Tsukasa AZUMA , Tatsuhiko Higashiki , Kyoichi Suguro
- 优先权： JP2010-154849 20100707
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; B29C59/02 ; B01J19/08
摘要：
According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.
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