Invention Application
- Patent Title: Ion source
- Patent Title (中): 离子源
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Application No.: US12804277Application Date: 2010-07-19
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Publication No.: US20120013249A1Publication Date: 2012-01-19
- Inventor: Manuel A. Jerez
- Applicant: Manuel A. Jerez
- Main IPC: H01J27/08
- IPC: H01J27/08 ; H01J61/04 ; H01J1/88
Abstract:
A cathode sub-assembly is comprised of a retainer, a cathode and a collar, each of which has smooth unthreaded surfaces that slidably engage each other. A shield serves to hold the sub-assembly in a support plate. The cathode projects from the sub-assembly into an arc chamber with a tortuous path created therebetween for passage of a plasma flow.
Public/Granted literature
- US08253334B2 Ion source Public/Granted day:2012-08-28
Information query
