- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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申请号： US13240803申请日： 2011-09-22
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公开(公告)号： US20120013869A1公开(公告)日： 2012-01-19
- 发明人: Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
- 申请人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03256820.6 20031028
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
公开/授权文献
- US08860923B2 Lithographic apparatus and device manufacturing method 公开/授权日：2014-10-14