发明申请
- 专利标题： METHOD AND DEVICE FOR PREPARING COMPOUND SEMICONDUCTOR FILM
- 专利标题（中）： 用于制备化合物半导体膜的方法和装置
-
申请号： US13258174申请日： 2010-03-25
-
公开(公告)号： US20120015505A1公开(公告)日： 2012-01-19
- 发明人: Beijun Zhong , Wenyu Cao , Yong Zhou , Zhanfeng Jiang
- 申请人： Beijun Zhong , Wenyu Cao , Yong Zhou , Zhanfeng Jiang
- 申请人地址： CN Shenzhen
- 专利权人： BYD Co., Ltd
- 当前专利权人： BYD Co., Ltd
- 当前专利权人地址： CN Shenzhen
- 优先权： CN20091010625.9 20090331
- 国际申请： PCT/CN2010/071333 WO 20100325
- 主分类号： H01L21/20
- IPC分类号： H01L21/20 ; C23C16/458 ; C23C16/455
摘要：
The present invention discloses a method and a device for preparing a compound semiconductor film. The method comprises the steps of: providing a substrate above at least an evaporation source in a vacuum condition; heating a source material contained in the evaporation source so that the source material is vapor-deposited on the substrate; and taking out the substrate under protection of an inert gas. The substrate may be rotated around an axis of a plane where the evaporation source is positioned, and the substrate is tilted by a predetermined angle with respect to the plane. The compound semi-conductive film thus prepared has a uniform thickness with a larger area. The method provides a simplified process and enhanced efficiency.
公开/授权文献
- US08470692B2 Method and device for preparing compound semiconductor film 公开/授权日：2013-06-25
信息查询
IPC分类:
