Invention Application
- Patent Title: PATTERN FORMING METHOD
- Patent Title (中): 图案形成方法
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Application No.: US13262238Application Date: 2010-02-17
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Publication No.: US20120027950A1Publication Date: 2012-02-02
- Inventor: Satoshi Wakamatsu , Noriko Yamashita
- Applicant: Satoshi Wakamatsu , Noriko Yamashita
- Applicant Address: JP TOKYO
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP TOKYO
- Priority: JP2009-082457 20090330
- International Application: PCT/JP2010/052342 WO 20100217
- Main IPC: C08J7/18
- IPC: C08J7/18
Abstract:
To provide a pattern forming method, which contains: providing an active species-supplying source to a pattern formable body; and applying excitation light to the active species-supplying source to form an oxide film on a surface of the pattern formable body.
Information query
