发明申请
- 专利标题: PATTERN MEASURING APPARATUS AND COMPUTER PROGRAM
- 专利标题(中): 图案测量装置和计算机程序
-
申请号: US13263826申请日: 2010-04-07
-
公开(公告)号: US20120037801A1公开(公告)日: 2012-02-16
- 发明人: Yuzuru Mochizuki , Maki Tanaka , Miki Isawa , Satoru Yamaguchi
- 申请人: Yuzuru Mochizuki , Maki Tanaka , Miki Isawa , Satoru Yamaguchi
- 优先权: JP2009-097572 20090414
- 国际申请: PCT/JP2010/002524 WO 20100407
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.
公开/授权文献
- US09000365B2 Pattern measuring apparatus and computer program 公开/授权日:2015-04-07