发明申请
US20120038053A1 Semiconductor Device and Method of Forming FO-WLCSP Having Conductive Layers and Conductive Vias Separated by Polymer Layers 有权
半导体器件和形成具有由聚合物层分离的导电层和导电通孔的FO-WLCSP的方法

  • 专利标题: Semiconductor Device and Method of Forming FO-WLCSP Having Conductive Layers and Conductive Vias Separated by Polymer Layers
  • 专利标题(中): 半导体器件和形成具有由聚合物层分离的导电层和导电通孔的FO-WLCSP的方法
  • 申请号: US12857362
    申请日: 2010-08-16
  • 公开(公告)号: US20120038053A1
    公开(公告)日: 2012-02-16
  • 发明人: JiHoon OhSinJae LeeJinGwan Kim
  • 申请人: JiHoon OhSinJae LeeJinGwan Kim
  • 申请人地址: SG Singapore
  • 专利权人: STATS CHIPPAC, LTD.
  • 当前专利权人: STATS CHIPPAC, LTD.
  • 当前专利权人地址: SG Singapore
  • 主分类号: H01L23/52
  • IPC分类号: H01L23/52 H01L21/768 H01L21/50
Semiconductor Device and Method of Forming FO-WLCSP Having Conductive Layers and Conductive Vias Separated by Polymer Layers
摘要:
A Fo-WLCSP has a first polymer layer formed around a semiconductor die. First conductive vias are formed through the first polymer layer around a perimeter of the semiconductor die. A first interconnect structure is formed over a first surface of the first polymer layer and electrically connected to the first conductive vias. The first interconnect structure has a second polymer layer and a plurality of second vias formed through the second polymer layer. A second interconnect structure is formed over a second surface of the first polymer layer and electrically connected to the first conductive vias. The second interconnect structure has a third polymer layer and a plurality of third vias formed through the third polymer layer. A semiconductor package can be mounted to the WLCSP in a PoP arrangement. The semiconductor package is electrically connected to the WLCSP through the first interconnect structure or second interconnect structure.
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