发明申请
- 专利标题： Top Coating Composition
- 专利标题（中）： 顶涂层组成
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申请号： US13264285申请日： 2010-04-20
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公开(公告)号： US20120040294A1公开(公告)日： 2012-02-16
- 发明人: Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
- 申请人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
- 申请人地址： JP Ube-shi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi
- 优先权： JP2009-103451 20090421
- 国际申请： PCT/JP2010/057007 WO 20100420
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08K5/05 ; C09D135/02
摘要：
Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]
公开/授权文献
- US08663903B2 Top coating composition 公开/授权日：2014-03-04