Invention Application
US20120044346A1 APPARATUS AND METHOD FOR INSPECTING INTERNAL DEFECT OF SUBSTRATE
审中-公开
检测基板内部缺陷的装置和方法
- Patent Title: APPARATUS AND METHOD FOR INSPECTING INTERNAL DEFECT OF SUBSTRATE
- Patent Title (中): 检测基板内部缺陷的装置和方法
-
Application No.: US13028692Application Date: 2011-02-16
-
Publication No.: US20120044346A1Publication Date: 2012-02-23
- Inventor: Yen-Chun CHOU , Cheng-Kai Chen , Jen-Ming Chang , Yu-Hsi Lee , Che-Min Lin
- Applicant: Yen-Chun CHOU , Cheng-Kai Chen , Jen-Ming Chang , Yu-Hsi Lee , Che-Min Lin
- Priority: TW099128148 20100823
- Main IPC: H04N9/04
- IPC: H04N9/04

Abstract:
An apparatus inspects internal defects of substrate, the substrate having an upper surface and a plurality of side surfaces connected with the upper surface. The apparatus includes at least one light source arranged on one of the side surfaces of the substrate and emitting a light beam on the corresponding side surface and into the substrate, the incident angle of the light beam is limited to a first predetermined angle within a range allowing the light beam to transmit in a total internal reflection manner in the substrate; an image capturing module arranged above the substrate to capture the image of the upper surface of the substrate, a light shield mask arranged between the image capturing module and the substrate and shielding an edge portion of the upper surface of the substrate.
Information query