发明申请
- 专利标题： Method of Controlling a Process and Process Control System
- 专利标题（中）： 控制过程和过程控制系统的方法
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申请号： US12871348申请日： 2010-08-30
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公开(公告)号： US20120053723A1公开(公告)日： 2012-03-01
- 发明人: Matthias Richter
- 申请人： Matthias Richter
- 主分类号： G06F17/00
- IPC分类号： G06F17/00 ; G06K9/00
摘要：
A system and a method for controlling a semiconductor manufacturing process are disclosed. The method comprises providing a plurality of structured wafers and taking a series of images from the plurality of structured wafers, wherein one image is taken for each structured wafer and wherein the image is taken of a same location for each structured wafer. The method further comprises extracting information of a parameter for each of the series of images and comparing the extracted information.